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INTRODUCTION TO THIN-FILM DEPOSITION PROCESSES

MS&E 434
Course Description

Introduction to major thin-film deposition techniques and properties of thin films. Evaporation, plasma assisted processes with emphasis on sputter deposition, chemical vapor deposition ion beams. Film properties and characterization methods, applications.

Prerequisties

(MS&E 330 and MS&E 351 ), graduate/professional standing, or member of Engineering Guest Students

Satisfies

This course does not satisfy any prerequisites.

Credits

Not Reported

Offered

Not Reported

Grade Point Average
3.94

12.57% from Historical

Completion Rate
100%

1.29% from Historical

A Rate
87.5%

103.59% from Historical

Class Size
16

-11.49% from Historical

Instructors (2025 Fall)

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