[{"run_id":"20260906T231458-5fdd2fff","observed_at":"2026-09-06 23:14:58.172943+00:00","course_uid":"course_d454019a3cd19fdc4e1b2af1","course_id":"DS 253","catalog_version_id":"0d20c78b5500a969a397912025d5be97d962faa1b640d660200f26af53dcd2e4","record_version_id":"930afca087ce5d0cee6e9afa0d40a71e82efa2bc86ea3341b1505d9f1cfeca00","job_id":"enrich-5291a20b802b9bbbe22b24cb","output_id":"ab3360d073d7706d108b929db4d0cb03664b70854df0217efcec07ba6cf4479c","section":"requirements","status":"invalid","value_json":null,"candidate_json":"{\"nodes\":[{\"children\":[\"n0\",\"n1\"],\"condition\":null,\"course\":null,\"evidence\":\"DS 152orDS 154\",\"id\":\"n0\",\"kind\":\"any\"},{\"children\":[],\"condition\":null,\"course\":{\"course_number\":152,\"minimum_grade\":null,\"subjects\":[\"DS\"],\"timing\":\"prior\"},\"evidence\":\"DS 152\",\"id\":\"n1\",\"kind\":\"course\"},{\"children\":[],\"condition\":null,\"course\":{\"course_number\":154,\"minimum_grade\":null,\"subjects\":[\"DS\"],\"timing\":\"prior\"},\"evidence\":\"DS 154\",\"id\":\"n2\",\"kind\":\"course\"}],\"notes\":[],\"root\":\"n0\",\"status\":\"parsed\"}","error":"Node n0 references itself; remove the self-reference.\nCycle reaches node n0; requirement graphs must be trees.\nUnreachable nodes: n2; connect all conditions and exclusions to the root.","model":"nvidia/Qwen3.6-35B-A3B-NVFP4","model_revision":"1355db6a052410cfd62085d94b58866fd0f2c3c5","selected_for_release":false},{"run_id":"20260906T231458-5fdd2fff","observed_at":"2026-09-06 23:14:58.172943+00:00","course_uid":"course_d454019a3cd19fdc4e1b2af1","course_id":"DS 253","catalog_version_id":"0d20c78b5500a969a397912025d5be97d962faa1b640d660200f26af53dcd2e4","record_version_id":"930afca087ce5d0cee6e9afa0d40a71e82efa2bc86ea3341b1505d9f1cfeca00","job_id":"enrich-5291a20b802b9bbbe22b24cb","output_id":"ab3360d073d7706d108b929db4d0cb03664b70854df0217efcec07ba6cf4479c","section":"search_profile","status":"valid","value_json":"{\"assumed_background\":[{\"evidence\":[{\"course_id\":\"DS 152\",\"field\":\"description\",\"quote\":\"Introduces core principles of fashion design with a focus on creativity, sustainability, critical thinking, and concept development. Emphasizes silhouette, proportion, scale, and materiality as foundational elements in developing design aesthetics. Includes research and sketching as part of the design process, from initial inspiration to presentation of garment concepts. Explores historical and contemporary fashion to inform original work. Develops skills in trend forecasting, market analysis, and flat sketching.\"},{\"course_id\":\"DS 154\",\"field\":\"description\",\"quote\":\"Introduces pattern manipulation through basic flat patternmaking principles.\"}],\"text\":\"Foundational fashion design principles, sketching, and basic pattern manipulation.\"}],\"search_phrases\":[\"apparel patternmaking basics\",\"fashion design flat sketching\",\"garment construction fundamentals\",\"DS 253 pattern drafting\"],\"skills_taught\":[{\"evidence\":[{\"course_id\":\"DS 253\",\"field\":\"description\",\"quote\":\"Explore foundational concepts and principles through manipulation of pattern blocks and the typology of garment styles and silhouettes to execute original designs.\"}],\"text\":\"Pattern block manipulation and silhouette typology.\"},{\"evidence\":[{\"course_id\":\"DS 253\",\"field\":\"description\",\"quote\":\"Develop pattern drafts for simple garments by applying fundamental patternmaking techniques (dart manipulation, adding fullness, contouring).\"}],\"text\":\"Dart manipulation, adding fullness, and contouring.\"},{\"evidence\":[{\"course_id\":\"DS 253\",\"field\":\"description\",\"quote\":\"Emphasis is placed on understanding garment construction in translating design concepts into accurate pattern drafts.\"}],\"text\":\"Translating design concepts into accurate pattern drafts.\"}],\"summary\":{\"evidence\":[{\"course_id\":\"DS 253\",\"field\":\"title\",\"quote\":\"PATTERNMAKING FOR FASHION DESIGN I\"},{\"course_id\":\"DS 253\",\"field\":\"description\",\"quote\":\"Introduces flat patternmaking as a fundamental technique in apparel design.\"}],\"text\":\"Introduces flat patternmaking for apparel design, teaching dart manipulation, fullness, and contouring to create accurate garment drafts.\"},\"topics\":[{\"evidence\":[{\"course_id\":\"DS 253\",\"field\":\"description\",\"quote\":\"manipulation of pattern blocks and the typology of garment styles and silhouettes\"}],\"text\":\"Pattern blocks and garment silhouettes.\"},{\"evidence\":[{\"course_id\":\"DS 253\",\"field\":\"description\",\"quote\":\"dart manipulation, adding fullness, contouring\"}],\"text\":\"Dart manipulation, fullness, and contouring techniques.\"},{\"evidence\":[{\"course_id\":\"DS 253\",\"field\":\"description\",\"quote\":\"translating design concepts into accurate pattern drafts\"}],\"text\":\"Design-to-pattern translation.\"}]}","candidate_json":null,"error":null,"model":"nvidia/Qwen3.6-35B-A3B-NVFP4","model_revision":"1355db6a052410cfd62085d94b58866fd0f2c3c5","selected_for_release":false},{"run_id":"20260906T231458-5fdd2fff","observed_at":"2026-09-06 23:14:58.172943+00:00","course_uid":"course_d454019a3cd19fdc4e1b2af1","course_id":"DS 253","catalog_version_id":"0d20c78b5500a969a397912025d5be97d962faa1b640d660200f26af53dcd2e4","record_version_id":"930afca087ce5d0cee6e9afa0d40a71e82efa2bc86ea3341b1505d9f1cfeca00","job_id":"enrich-5291a20b802b9bbbe22b24cb","output_id":"ab3360d073d7706d108b929db4d0cb03664b70854df0217efcec07ba6cf4479c","section":"student_experience","status":"insufficient_evidence","value_json":"{\"status\":\"insufficient_evidence\",\"themes\":[]}","candidate_json":null,"error":null,"model":"nvidia/Qwen3.6-35B-A3B-NVFP4","model_revision":"1355db6a052410cfd62085d94b58866fd0f2c3c5","selected_for_release":false},{"run_id":"20260907T155543-ce3781c4","observed_at":"2026-09-07 15:55:43.033547+00:00","course_uid":"course_d454019a3cd19fdc4e1b2af1","course_id":"DS 253","catalog_version_id":"0d20c78b5500a969a397912025d5be97d962faa1b640d660200f26af53dcd2e4","record_version_id":"930afca087ce5d0cee6e9afa0d40a71e82efa2bc86ea3341b1505d9f1cfeca00","job_id":"enrich-5590a4969e0a630fe46a86e8","output_id":"342553c0401072eb0ee3c581450e6f15e6b3606071f271de8aeed7d3c916b239","section":"requirements","status":"valid","value_json":"{\"nodes\":[{\"children\":[\"n1\",\"n2\"],\"condition\":null,\"course\":null,\"evidence\":\"DS 152orDS 154\",\"id\":\"n0\",\"kind\":\"any\"},{\"children\":[],\"condition\":null,\"course\":{\"course_number\":152,\"minimum_grade\":null,\"subjects\":[\"DS\"],\"timing\":\"prior\"},\"evidence\":\"DS 152\",\"id\":\"n1\",\"kind\":\"course\"},{\"children\":[],\"condition\":null,\"course\":{\"course_number\":154,\"minimum_grade\":null,\"subjects\":[\"DS\"],\"timing\":\"prior\"},\"evidence\":\"DS 154\",\"id\":\"n2\",\"kind\":\"course\"}],\"notes\":[],\"root\":\"n0\",\"status\":\"parsed\"}","candidate_json":null,"error":null,"model":"nvidia/Qwen3.6-35B-A3B-NVFP4","model_revision":"1355db6a052410cfd62085d94b58866fd0f2c3c5","selected_for_release":true},{"run_id":"20260907T155543-ce3781c4","observed_at":"2026-09-07 15:55:43.033547+00:00","course_uid":"course_d454019a3cd19fdc4e1b2af1","course_id":"DS 253","catalog_version_id":"0d20c78b5500a969a397912025d5be97d962faa1b640d660200f26af53dcd2e4","record_version_id":"930afca087ce5d0cee6e9afa0d40a71e82efa2bc86ea3341b1505d9f1cfeca00","job_id":"enrich-5590a4969e0a630fe46a86e8","output_id":"342553c0401072eb0ee3c581450e6f15e6b3606071f271de8aeed7d3c916b239","section":"search_profile","status":"valid","value_json":"{\"assumed_background\":[{\"evidence\":[{\"course_id\":\"DS 152\",\"field\":\"description\",\"quote\":\"Introduces core principles of fashion design with a focus on creativity, sustainability, critical thinking, and concept development. Emphasizes silhouette, proportion, scale, and materiality as foundational elements in developing design aesthetics. Includes research and sketching as part of the design process, from initial inspiration to presentation of garment concepts. Explores historical and contemporary fashion to inform original work. Develops skills in trend forecasting, market analysis, and flat sketching.\"},{\"course_id\":\"DS 154\",\"field\":\"description\",\"quote\":\"Introduces pattern manipulation through basic flat patternmaking principles.\"}],\"text\":\"Foundational fashion design principles, sketching, and basic pattern manipulation.\"}],\"search_phrases\":[\"apparel patternmaking basics\",\"fashion design flat sketching\",\"garment construction fundamentals\",\"DS 253 pattern drafting\"],\"skills_taught\":[{\"evidence\":[{\"course_id\":\"DS 253\",\"field\":\"description\",\"quote\":\"Explore foundational concepts and principles through manipulation of pattern blocks and the typology of garment styles and silhouettes to execute original designs.\"}],\"text\":\"Pattern block manipulation and silhouette typology.\"},{\"evidence\":[{\"course_id\":\"DS 253\",\"field\":\"description\",\"quote\":\"Develop pattern drafts for simple garments by applying fundamental patternmaking techniques (dart manipulation, adding fullness, contouring).\"}],\"text\":\"Dart manipulation, adding fullness, and contouring.\"},{\"evidence\":[{\"course_id\":\"DS 253\",\"field\":\"description\",\"quote\":\"Emphasis is placed on understanding garment construction in translating design concepts into accurate pattern drafts.\"}],\"text\":\"Translating design concepts into accurate pattern drafts.\"}],\"summary\":{\"evidence\":[{\"course_id\":\"DS 253\",\"field\":\"title\",\"quote\":\"PATTERNMAKING FOR FASHION DESIGN I\"},{\"course_id\":\"DS 253\",\"field\":\"description\",\"quote\":\"Introduces flat patternmaking as a fundamental technique in apparel design.\"}],\"text\":\"Introduces flat patternmaking for apparel design, teaching dart manipulation, fullness, and contouring to create accurate garment drafts.\"},\"topics\":[{\"evidence\":[{\"course_id\":\"DS 253\",\"field\":\"description\",\"quote\":\"manipulation of pattern blocks and the typology of garment styles and silhouettes\"}],\"text\":\"Pattern blocks and garment silhouettes.\"},{\"evidence\":[{\"course_id\":\"DS 253\",\"field\":\"description\",\"quote\":\"dart manipulation, adding fullness, contouring\"}],\"text\":\"Dart manipulation, fullness, and contouring techniques.\"},{\"evidence\":[{\"course_id\":\"DS 253\",\"field\":\"description\",\"quote\":\"translating design concepts into accurate pattern drafts\"}],\"text\":\"Design-to-pattern translation.\"}]}","candidate_json":null,"error":null,"model":"nvidia/Qwen3.6-35B-A3B-NVFP4","model_revision":"1355db6a052410cfd62085d94b58866fd0f2c3c5","selected_for_release":true},{"run_id":"20260907T155543-ce3781c4","observed_at":"2026-09-07 15:55:43.033547+00:00","course_uid":"course_d454019a3cd19fdc4e1b2af1","course_id":"DS 253","catalog_version_id":"0d20c78b5500a969a397912025d5be97d962faa1b640d660200f26af53dcd2e4","record_version_id":"930afca087ce5d0cee6e9afa0d40a71e82efa2bc86ea3341b1505d9f1cfeca00","job_id":"enrich-5590a4969e0a630fe46a86e8","output_id":"342553c0401072eb0ee3c581450e6f15e6b3606071f271de8aeed7d3c916b239","section":"student_experience","status":"insufficient_evidence","value_json":"{\"status\":\"insufficient_evidence\",\"themes\":[]}","candidate_json":null,"error":null,"model":"nvidia/Qwen3.6-35B-A3B-NVFP4","model_revision":"1355db6a052410cfd62085d94b58866fd0f2c3c5","selected_for_release":true},{"run_id":"20260906T231458-5fdd2fff","observed_at":"2026-09-06 23:14:58.172943+00:00","course_uid":"course_d454019a3cd19fdc4e1b2af1","course_id":"DS 253","catalog_version_id":"0d20c78b5500a969a397912025d5be97d962faa1b640d660200f26af53dcd2e4","record_version_id":"930afca087ce5d0cee6e9afa0d40a71e82efa2bc86ea3341b1505d9f1cfeca00","job_id":"enrich-789789da373eecc1ff75f626","output_id":"a6ad866a3469366e40332ae2282dfe32777b554f0e32507f0240706fed4b4ed2","section":"requirements","status":"valid","value_json":"{\"nodes\":[{\"children\":[\"n1\",\"n2\"],\"condition\":null,\"course\":null,\"evidence\":\"DS 152orDS 154\",\"id\":\"n0\",\"kind\":\"any\"},{\"children\":[],\"condition\":null,\"course\":{\"course_number\":152,\"minimum_grade\":null,\"subjects\":[\"DS\"],\"timing\":\"prior\"},\"evidence\":\"DS 152\",\"id\":\"n1\",\"kind\":\"course\"},{\"children\":[],\"condition\":null,\"course\":{\"course_number\":154,\"minimum_grade\":null,\"subjects\":[\"DS\"],\"timing\":\"prior\"},\"evidence\":\"DS 154\",\"id\":\"n2\",\"kind\":\"course\"}],\"notes\":[],\"root\":\"n0\",\"status\":\"parsed\"}","candidate_json":null,"error":null,"model":"nvidia/Qwen3.6-35B-A3B-NVFP4","model_revision":"1355db6a052410cfd62085d94b58866fd0f2c3c5","selected_for_release":false},{"run_id":"20260906T231458-5fdd2fff","observed_at":"2026-09-06 23:14:58.172943+00:00","course_uid":"course_d454019a3cd19fdc4e1b2af1","course_id":"DS 253","catalog_version_id":"0d20c78b5500a969a397912025d5be97d962faa1b640d660200f26af53dcd2e4","record_version_id":"930afca087ce5d0cee6e9afa0d40a71e82efa2bc86ea3341b1505d9f1cfeca00","job_id":"enrich-789789da373eecc1ff75f626","output_id":"a6ad866a3469366e40332ae2282dfe32777b554f0e32507f0240706fed4b4ed2","section":"search_profile","status":"valid","value_json":"{\"assumed_background\":[{\"evidence\":[{\"course_id\":\"DS 152\",\"field\":\"description\",\"quote\":\"Introduces core principles of fashion design with a focus on creativity, sustainability, critical thinking, and concept development. Emphasizes silhouette, proportion, scale, and materiality as foundational elements in developing design aesthetics. Includes research and sketching as part of the design process, from initial inspiration to presentation of garment concepts. Explores historical and contemporary fashion to inform original work. Develops skills in trend forecasting, market analysis, and flat sketching.\"},{\"course_id\":\"DS 154\",\"field\":\"description\",\"quote\":\"Introduces pattern manipulation through basic flat patternmaking principles.\"}],\"text\":\"Foundational fashion design principles, sketching, and basic pattern manipulation.\"}],\"search_phrases\":[\"apparel patternmaking basics\",\"fashion design flat sketching\",\"garment construction fundamentals\",\"DS 253 pattern drafting\"],\"skills_taught\":[{\"evidence\":[{\"course_id\":\"DS 253\",\"field\":\"description\",\"quote\":\"Explore foundational concepts and principles through manipulation of pattern blocks and the typology of garment styles and silhouettes to execute original designs.\"}],\"text\":\"Pattern block manipulation and silhouette typology.\"},{\"evidence\":[{\"course_id\":\"DS 253\",\"field\":\"description\",\"quote\":\"Develop pattern drafts for simple garments by applying fundamental patternmaking techniques (dart manipulation, adding fullness, contouring).\"}],\"text\":\"Dart manipulation, adding fullness, and contouring.\"},{\"evidence\":[{\"course_id\":\"DS 253\",\"field\":\"description\",\"quote\":\"Emphasis is placed on understanding garment construction in translating design concepts into accurate pattern drafts.\"}],\"text\":\"Translating design concepts into accurate pattern drafts.\"}],\"summary\":{\"evidence\":[{\"course_id\":\"DS 253\",\"field\":\"title\",\"quote\":\"PATTERNMAKING FOR FASHION DESIGN I\"},{\"course_id\":\"DS 253\",\"field\":\"description\",\"quote\":\"Introduces flat patternmaking as a fundamental technique in apparel design.\"}],\"text\":\"Introduces flat patternmaking for apparel design, teaching dart manipulation, fullness, and contouring to create accurate garment drafts.\"},\"topics\":[{\"evidence\":[{\"course_id\":\"DS 253\",\"field\":\"description\",\"quote\":\"manipulation of pattern blocks and the typology of garment styles and silhouettes\"}],\"text\":\"Pattern blocks and garment silhouettes.\"},{\"evidence\":[{\"course_id\":\"DS 253\",\"field\":\"description\",\"quote\":\"dart manipulation, adding fullness, contouring\"}],\"text\":\"Dart manipulation, fullness, and contouring techniques.\"},{\"evidence\":[{\"course_id\":\"DS 253\",\"field\":\"description\",\"quote\":\"translating design concepts into accurate pattern drafts\"}],\"text\":\"Design-to-pattern translation.\"}]}","candidate_json":null,"error":null,"model":"nvidia/Qwen3.6-35B-A3B-NVFP4","model_revision":"1355db6a052410cfd62085d94b58866fd0f2c3c5","selected_for_release":false},{"run_id":"20260906T231458-5fdd2fff","observed_at":"2026-09-06 23:14:58.172943+00:00","course_uid":"course_d454019a3cd19fdc4e1b2af1","course_id":"DS 253","catalog_version_id":"0d20c78b5500a969a397912025d5be97d962faa1b640d660200f26af53dcd2e4","record_version_id":"930afca087ce5d0cee6e9afa0d40a71e82efa2bc86ea3341b1505d9f1cfeca00","job_id":"enrich-789789da373eecc1ff75f626","output_id":"a6ad866a3469366e40332ae2282dfe32777b554f0e32507f0240706fed4b4ed2","section":"student_experience","status":"insufficient_evidence","value_json":"{\"status\":\"insufficient_evidence\",\"themes\":[]}","candidate_json":null,"error":null,"model":"nvidia/Qwen3.6-35B-A3B-NVFP4","model_revision":"1355db6a052410cfd62085d94b58866fd0f2c3c5","selected_for_release":false},{"run_id":"20260907T155543-ce3781c4","observed_at":"2026-09-07 15:55:43.033547+00:00","course_uid":"course_d454019a3cd19fdc4e1b2af1","course_id":"DS 253","catalog_version_id":"0d20c78b5500a969a397912025d5be97d962faa1b640d660200f26af53dcd2e4","record_version_id":"930afca087ce5d0cee6e9afa0d40a71e82efa2bc86ea3341b1505d9f1cfeca00","job_id":"enrich-8b774950c2b6adfdc46d1b82","output_id":"903721725cd2490843614a3b74257e69838ff26efa1ee457c757e7ed97d398c0","section":"requirements","status":"valid","value_json":"{\"nodes\":[{\"children\":[\"n1\",\"n2\"],\"condition\":null,\"course\":null,\"evidence\":\"DS 152orDS 154\",\"id\":\"n0\",\"kind\":\"any\"},{\"children\":[],\"condition\":null,\"course\":{\"course_number\":152,\"minimum_grade\":null,\"subjects\":[\"DS\"],\"timing\":\"prior\"},\"evidence\":\"DS 152\",\"id\":\"n1\",\"kind\":\"course\"},{\"children\":[],\"condition\":null,\"course\":{\"course_number\":154,\"minimum_grade\":null,\"subjects\":[\"DS\"],\"timing\":\"prior\"},\"evidence\":\"DS 154\",\"id\":\"n2\",\"kind\":\"course\"}],\"notes\":[],\"root\":\"n0\",\"status\":\"parsed\"}","candidate_json":null,"error":null,"model":"nvidia/Qwen3.6-35B-A3B-NVFP4","model_revision":"1355db6a052410cfd62085d94b58866fd0f2c3c5","selected_for_release":true},{"run_id":"20260907T155543-ce3781c4","observed_at":"2026-09-07 15:55:43.033547+00:00","course_uid":"course_d454019a3cd19fdc4e1b2af1","course_id":"DS 253","catalog_version_id":"0d20c78b5500a969a397912025d5be97d962faa1b640d660200f26af53dcd2e4","record_version_id":"930afca087ce5d0cee6e9afa0d40a71e82efa2bc86ea3341b1505d9f1cfeca00","job_id":"enrich-8b774950c2b6adfdc46d1b82","output_id":"903721725cd2490843614a3b74257e69838ff26efa1ee457c757e7ed97d398c0","section":"search_profile","status":"valid","value_json":"{\"assumed_background\":[{\"evidence\":[{\"course_id\":\"DS 152\",\"field\":\"description\",\"quote\":\"Introduces core principles of fashion design with a focus on creativity, sustainability, critical thinking, and concept development. Emphasizes silhouette, proportion, scale, and materiality as foundational elements in developing design aesthetics. Includes research and sketching as part of the design process, from initial inspiration to presentation of garment concepts. Explores historical and contemporary fashion to inform original work. Develops skills in trend forecasting, market analysis, and flat sketching.\"},{\"course_id\":\"DS 154\",\"field\":\"description\",\"quote\":\"Introduces pattern manipulation through basic flat patternmaking principles.\"}],\"text\":\"Foundational fashion design principles, sketching, and basic pattern manipulation.\"}],\"search_phrases\":[\"apparel patternmaking basics\",\"fashion design flat sketching\",\"garment construction fundamentals\",\"DS 253 pattern drafting\"],\"skills_taught\":[{\"evidence\":[{\"course_id\":\"DS 253\",\"field\":\"description\",\"quote\":\"Explore foundational concepts and principles through manipulation of pattern blocks and the typology of garment styles and silhouettes to execute original designs.\"}],\"text\":\"Pattern block manipulation and silhouette typology.\"},{\"evidence\":[{\"course_id\":\"DS 253\",\"field\":\"description\",\"quote\":\"Develop pattern drafts for simple garments by applying fundamental patternmaking techniques (dart manipulation, adding fullness, contouring).\"}],\"text\":\"Dart manipulation, adding fullness, and contouring.\"},{\"evidence\":[{\"course_id\":\"DS 253\",\"field\":\"description\",\"quote\":\"Emphasis is placed on understanding garment construction in translating design concepts into accurate pattern drafts.\"}],\"text\":\"Translating design concepts into accurate pattern drafts.\"}],\"summary\":{\"evidence\":[{\"course_id\":\"DS 253\",\"field\":\"title\",\"quote\":\"PATTERNMAKING FOR FASHION DESIGN I\"},{\"course_id\":\"DS 253\",\"field\":\"description\",\"quote\":\"Introduces flat patternmaking as a fundamental technique in apparel design.\"}],\"text\":\"Introduces flat patternmaking for apparel design, teaching dart manipulation, fullness, and contouring to create accurate garment drafts.\"},\"topics\":[{\"evidence\":[{\"course_id\":\"DS 253\",\"field\":\"description\",\"quote\":\"manipulation of pattern blocks and the typology of garment styles and silhouettes\"}],\"text\":\"Pattern blocks and garment silhouettes.\"},{\"evidence\":[{\"course_id\":\"DS 253\",\"field\":\"description\",\"quote\":\"dart manipulation, adding fullness, contouring\"}],\"text\":\"Dart manipulation, fullness, and contouring techniques.\"},{\"evidence\":[{\"course_id\":\"DS 253\",\"field\":\"description\",\"quote\":\"translating design concepts into accurate pattern drafts\"}],\"text\":\"Design-to-pattern translation.\"}]}","candidate_json":null,"error":null,"model":"nvidia/Qwen3.6-35B-A3B-NVFP4","model_revision":"1355db6a052410cfd62085d94b58866fd0f2c3c5","selected_for_release":true},{"run_id":"20260907T155543-ce3781c4","observed_at":"2026-09-07 15:55:43.033547+00:00","course_uid":"course_d454019a3cd19fdc4e1b2af1","course_id":"DS 253","catalog_version_id":"0d20c78b5500a969a397912025d5be97d962faa1b640d660200f26af53dcd2e4","record_version_id":"930afca087ce5d0cee6e9afa0d40a71e82efa2bc86ea3341b1505d9f1cfeca00","job_id":"enrich-8b774950c2b6adfdc46d1b82","output_id":"903721725cd2490843614a3b74257e69838ff26efa1ee457c757e7ed97d398c0","section":"student_experience","status":"insufficient_evidence","value_json":"{\"status\":\"insufficient_evidence\",\"themes\":[]}","candidate_json":null,"error":null,"model":"nvidia/Qwen3.6-35B-A3B-NVFP4","model_revision":"1355db6a052410cfd62085d94b58866fd0f2c3c5","selected_for_release":true},{"run_id":"20260907T155543-ce3781c4","observed_at":"2026-09-07 15:55:43.033547+00:00","course_uid":"course_d454019a3cd19fdc4e1b2af1","course_id":"DS 253","catalog_version_id":"0d20c78b5500a969a397912025d5be97d962faa1b640d660200f26af53dcd2e4","record_version_id":"930afca087ce5d0cee6e9afa0d40a71e82efa2bc86ea3341b1505d9f1cfeca00","job_id":"enrich-8b774950c2b6adfdc46d1b82","output_id":"903721725cd2490843614a3b74257e69838ff26efa1ee457c757e7ed97d398c0","section":"student_summary","status":"valid","value_json":"{\"context_hash\":\"8233877910b6e00007a094f73d51f43f4acef83024d7dc21291d5ffd3144489f\",\"course_id\":\"DS 253\",\"current_instructors\":[{\"instructor_uid\":\"instructor_a4600b33bb83ed8615df0c0b\",\"message\":\"No course-specific reviews available\",\"name\":\"Bowen Zhan\",\"review_status\":\"no_course_reviews\",\"rmp_instructor_id\":null,\"summary\":[{\"citations\":[{\"course_id\":\"DS 253\",\"run_id\":\"20260907T155543-ce3781c4\",\"section_number\":1,\"source_course_id\":\"5fedb3f4-b90f-3799-91f7-b8d8037c6852\",\"source_record\":{\"entity_id\":\"5fedb3f4-b90f-3799-91f7-b8d8037c6852\",\"file\":\"tables/observations.parquet\",\"kind\":\"grades\",\"source\":\"madgrades\"},\"table\":\"section_grades_latest\",\"term_id\":\"1262\",\"type\":\"grade\"},{\"course_id\":\"DS 253\",\"run_id\":\"20260907T155543-ce3781c4\",\"section_number\":2,\"source_course_id\":\"5fedb3f4-b90f-3799-91f7-b8d8037c6852\",\"source_record\":{\"entity_id\":\"5fedb3f4-b90f-3799-91f7-b8d8037c6852\",\"file\":\"tables/observations.parquet\",\"kind\":\"grades\",\"source\":\"madgrades\"},\"table\":\"section_grades_latest\",\"term_id\":\"1262\",\"type\":\"grade\"}],\"text\":\"Recent recorded grades — Fall 2025: 3.93 GPA, 96.7% A/AB (n=30 letter grades).\"}]}],\"difficulty_workload\":[],\"errors\":[],\"historical_context\":[],\"message\":\"No course-specific reviews available\",\"offered\":true,\"profile_hash\":\"5cb4dabf887cdbcd8c00d5a1312e10828b95c63f30bc3ea76aea199565390d02\",\"quick_take\":[{\"citations\":[{\"course_id\":\"DS 253\",\"run_id\":\"20260907T155543-ce3781c4\",\"source_record\":{\"entity_id\":\"5fedb3f4-b90f-3799-91f7-b8d8037c6852\",\"file\":\"tables/observations.parquet\",\"kind\":\"grades\",\"source\":\"madgrades\"},\"table\":\"grades_latest\",\"term_id\":\"1242\",\"type\":\"grade\"},{\"course_id\":\"DS 253\",\"run_id\":\"20260907T155543-ce3781c4\",\"source_record\":{\"entity_id\":\"5fedb3f4-b90f-3799-91f7-b8d8037c6852\",\"file\":\"tables/observations.parquet\",\"kind\":\"grades\",\"source\":\"madgrades\"},\"table\":\"grades_latest\",\"term_id\":\"1252\",\"type\":\"grade\"},{\"course_id\":\"DS 253\",\"run_id\":\"20260907T155543-ce3781c4\",\"source_record\":{\"entity_id\":\"5fedb3f4-b90f-3799-91f7-b8d8037c6852\",\"file\":\"tables/observations.parquet\",\"kind\":\"grades\",\"source\":\"madgrades\"},\"table\":\"grades_latest\",\"term_id\":\"1262\",\"type\":\"grade\"}],\"text\":\"Recent recorded grades — Fall 2023: 3.58 GPA, 63.2% A/AB (n=19 letter grades); Fall 2024: 3.45 GPA, 68.2% A/AB (n=22 letter grades); Fall 2025: 3.93 GPA, 96.7% A/AB (n=30 letter grades).\"}],\"student_experience\":[],\"task_hash\":\"74fb0997943e888960bbc9e47db8c4fd12e4292d55c20509d8d89db6a9910f68\",\"teaching_history\":[{\"citations\":[{\"course_id\":\"DS 253\",\"run_id\":\"20260907T155543-ce3781c4\",\"section_number\":1,\"source_course_id\":\"5fedb3f4-b90f-3799-91f7-b8d8037c6852\",\"source_record\":{\"entity_id\":\"5fedb3f4-b90f-3799-91f7-b8d8037c6852\",\"file\":\"tables/observations.parquet\",\"kind\":\"grades\",\"source\":\"madgrades\"},\"table\":\"section_grades_latest\",\"term_id\":\"1262\",\"type\":\"grade\"},{\"course_id\":\"DS 253\",\"run_id\":\"20260907T155543-ce3781c4\",\"section_number\":2,\"source_course_id\":\"5fedb3f4-b90f-3799-91f7-b8d8037c6852\",\"source_record\":{\"entity_id\":\"5fedb3f4-b90f-3799-91f7-b8d8037c6852\",\"file\":\"tables/observations.parquet\",\"kind\":\"grades\",\"source\":\"madgrades\"},\"table\":\"section_grades_latest\",\"term_id\":\"1262\",\"type\":\"grade\"}],\"text\":\"BOWEN ZHAN is recorded teaching in Fall 2025. Recorded history may be incomplete and does not establish a future schedule.\"}],\"term_id\":\"1272\",\"term_name\":\"2026 Fall\",\"version\":2}","candidate_json":null,"error":null,"model":"nvidia/Qwen3.6-35B-A3B-NVFP4","model_revision":"1355db6a052410cfd62085d94b58866fd0f2c3c5","selected_for_release":true}]